Usoro 6N Ultra-High-Purity Sulfur Distillation na usoro dị ọcha nwere nkọwa zuru ezu.

Mmepụta nke 6N (≥99.9999% ịdị ọcha) sọlfọ dị ọcha na-achọ ọtụtụ distillation, mgbasa ozi miri emi, na nzacha ultra-dị ọcha iji kpochapụ ọla ndị dị n'ahụ, adịghị ọcha na ihe ndị dị na ya. N'okpuru ebe a bụ usoro ụlọ ọrụ mmepụta ihe na-ejikọta agụụ distillation, nchacha ngwa ngwa na-enyere aka dị ọcha, na teknụzụ ziri ezi mgbe ọgwụgwọ gasịrị.

M. Ngwọta ihe eji eme ihe na mwepu adịghị ọcha

1. Nhọrọ na nhazi ihe eji eme ihe

• ;Ihe achọrọ‌: Ịdị ọcha sọlfọ mbụ ≥99.9% (ọkwa 3N), adịghị ọcha ígwè ≤500 ppm, ọdịnaya carbon carbon ≤0.1%.
• ;Na-agbaze Microwave-enyere aka:
  A na-edozi sọlfọ crude n'ime igwe ọkụ ọkụ (2.45 GHz ugboro, ike 10–15 kW) na 140-150°C. Ntugharị dipole na-ebute Microwave na-eme ka agbaze ngwa ngwa ka ọ na-emebi adịghị ọcha (dịka ọmụmaatụ, ogige tar). Oge ịgbaze: 30-45 nkeji; omimi ntinye ngwa ndakwa nri: 10-15 cm
• ;Ịsacha mmiri deionized:
  A na-agwakọta sọlfọ a wụrụ awụ na mmiri deionized (resistivity ≥18 MΩ · cm) na 1: 0.3 mass ratio na a kpaliri reactor (120 Celsius C, 2 mmanya mgbali) maka 1 hour iji wepụ mmiri-soluble salts (dịka, ammonium sulfate, sodium chloride). A na-ewepụ usoro mmiri mmiri ma jiri ya mee ihe maka usoro 2-3 ruo mgbe conductivity ≤5 μS/cm.

2. Multi-Stage Adsorption na Filtration‌

• ;Ụwa Diatomaceous/ Mgbasa Ozi Carbon Na-arụ Ọrụ:
  A na-agbakwunye ụwa Diatomaceous (0.5-1%) na carbon na-arụ ọrụ (0.2-0.5%) na sọlfọ a wụrụ awụ n'okpuru nchebe nitrogen (130 Celsius C, ihe na-akpali awa 2) iji mee ka ogige ígwè na ihe ndị fọdụrụnụ.
• ;Ultra-nkenke nzacha:
  Nzacha nke ọkwa abụọ site na iji titanium sintered filter (0.1 μm pore size) na ≤0.5 MPa usoro nrụgide. Ọnụọgụ ụmụ irighiri ihe nzacha gachara: ≤10 irighiri ihe / L (nha> 0.5 μm).

II. Usoro mkpochapụ oghere ọtụtụ ogbo‌

1. Distillation nke mbụ (Mwepụ adịghị ọcha nke igwe)‌

• ;Akụrụngwa‌: kọlụm distillation quartz dị elu dị ọcha na ngwugwu 316L igwe anaghị agba nchara (≥15 theoretical plates), agụụ ≤1 kPa.
• ;Parameter arụ ọrụ:
• ;Nri okpomọkụ‌: 250-280°C (sulfur esi na 444.6°C n'okpuru ambient mgbali; agụụ na-ebelata esi esi ruo 260-300°C).
• ;Oke reflux: 5:1–8:1; kọlụm n'elu okpomọkụ mgbanwe ≤±0.5°C.
• ;Ngwaahịa‌: sọlfọ dị ọcha condensed ≥99.99% (4N ọkwa), ngụkọta metal adịghị ọcha (Fe, Cu, Ni) ≤1 ppm.

2. Ọkpụkpụ Molecular nke abụọ (Mwepụ adịghị ọcha Organic)‌

• ;Akụrụngwa‌: Ihe distiller molecular nke dị mkpụmkpụ na 10-20 mm evaporation-condensation gap, evaporation okpomọkụ 300-320 ° C, agụụ ≤0.1 Pa.
• ;Nkewa adịghị ọcha:
  A na-ekpochapụ ihe ndị na-esi ísì ụtọ (dịka ọmụmaatụ, thioethers, thiophene) ma wepụ ya, ebe adịghị ọcha na-esi ísì (dịka ọmụmaatụ, polyaromatics) na-anọgide na-adị na nsị n'ihi ọdịiche dị na ụzọ efu molecular.
• ;Ngwaahịa‌: sọlfọ dị ọcha ≥99.999% (5N ọkwa), organic carbon ≤0.001%, ihe fọdụrụ <0.3%.

3. Nnụcha mpaghara atọ (Inweta ịdị ọcha 6N)‌

• ;Akụrụngwa‌: Nnụcha mpaghara kwụ ọtọ na njikwa okpomọkụ nke ọtụtụ mpaghara (± 0.1 Celsius C), ọsọ njem mpaghara 1-3 mm / h.
• ;Nkewa:
  Iji ọnụọgụ nkewa (K=Csolid/CliquidK=Csiri ike /Cmmiri mmiri), mpaghara 20-30 na-agafe ọla kọpa (As, Sb) na njedebe ingot. A na-atụfu 10-15% ikpeazụ nke sọlfọ ingot.

III. Ọgwụgwọ-ọgwụgwọ na Ultra-Clean Forming

1. Ultra-dị ọcha mgbaze mmịpụta

• ;Mwepụta Ether/Carbon Tetrachloride:
  A na-ejikọta sọlfọ na chromatographic-grade ether (1: 0.5 volume ratio) n'okpuru enyemaka ultrasonic (40 kHz, 40 ° C) maka nkeji 30 iji wepụ trace polar organics .
• ;mgbake mgbake:
  Mgbakwunye sieve molecular na mkpochapụ agụụ na-ebelata ihe mgbaze ruo ≤0.1 ppm.

2. Ultrafiltration na ion Exchange

• ;PTFE membrane Ultrafiltration:
  A na-enyocha sọlfọ a wụrụ awụ site na 0.02 μm PTFE membranes na 160-180 ° C na nrụgide ≤0.2 MPa.
• ;Mgbanwe nke ion mgbanwe resins:
  Resins chelating (dịka ọmụmaatụ, Amberlite IRC-748) na-ewepu ion metal ppb (Cu²⁺, Fe³⁺) na 1–2 BV/h ọnụego erute.

3. Ịmepụta gburugburu dị ọcha dị ọcha

• ;Inert gas atomization:
  N'ime ụlọ dị ọcha nke klaasị 10, sọlfọ a wụrụ awụ na-eji nitrogen (nrụgide 0.8-1.2 MPa) banye n'ime granules okirikiri 0.5-1 mm (mmiri <0.001%).
• ;Nkwakọ ngwaahịa Vacuum:
  A na-ekpuchi ngwaahịa ikpeazụ na agụụ na-ekpuchi ihe nkiri aluminom mejupụtara n'okpuru argon dị ọcha (≥99.9999% ịdị ọcha) iji gbochie oxidation.

IV. Usoro usoro igodo

V. Njikwa Ogo na Nnwale

1. ;Chọpụta ihe nyocha adịghị ọcha:

• ;GD-MS (Glow Discharge Mass Spectrometry)‌: Na-achọpụta ọla na ≤0.01 ppb.
• ;TOC Analyzer‌: Na-atụ carbon organic ≤0.001 ppm.

1. ;Njikwa nha urughuru:
   Mgbasa laser (Mastersizer 3000) na-eme ka mgbawa D50 ≤± 0.05 mm.
2. ;Ịdị ọcha nke elu:
   XPS (X-ray Photoelectron Spectroscopy) na-akwado ọkpụrụkpụ oxide elu ≤1 nm.

VI. Nchekwa na gburugburu ebe obibi

1. ;Mgbochi mgbawa:
   Ndị na-achọpụta ire ọkụ infrared na sistemụ idei mmiri nitrogen na-edobe ọkwa oxygen <3%
2. ;Njikwa ikuku:

• ;Acid Gases‌: Nhịahụ NaOH nke agba abụọ (20% + 10%) na-ewepụ ≥99.9% H₂S/SO₂.
• ;VOCs‌: Zeolite rotor + RTO (850°C) na-ebelata hydrocarbons na-abụghị methane ka ≤10 mg/m³.

1. ;Imegharị ihe mkpofu:
   Mbelata okpomọkụ dị elu (1200 Celsius) na-eweghachi ọla; Ọdịnaya sọlfọ fọdụrụ <0.1%.

VII. Teknụzụ-Economic Metrics

• ;Oriri ike‌: 800-1200 kWh ọkụ eletrik na 2-3 tọn uzuoku kwa ton nke 6N sọlfọ.
• ;Mmụba‌: Sulfur mgbake ≥85%, ihe fọdụrụ <1.5%.
• ;Ọnụ‌: Ọnụ ahịa mmepụta ~ 120,000-180,000 CNY / ton; Ọnụ ahịa ahịa 250,000–350,000 CNY/ton (ọkwa semiconductor) .

Usoro a na-emepụta 6N sọlfọ maka semiconductor photoresists, III-V compound substrates, na ngwa ndị ọzọ dị elu. Nleba anya oge (dịka ọmụmaatụ, nyocha elemental LIBS) na nhazi ụlọ dị ọcha nke ISO Class 1 na-eme ka ịdị mma na-agbanwe agbanwe.

Ihe odide ala ala peeji

1. Ntụaka 2: Ụkpụrụ Nchacha Sulfur ụlọ ọrụ
2. Ntụaka 3: Usoro nzacha dị elu na injinịa kemịkalụ
3. Ntụaka 6: Akwụkwọ ntuziaka na-ahazi ihe dị ọcha
4. Ntuziaka 8: Semiconductor-Grade Chemical Production Protocols
5. Ntụaka 5: Nrụpụta ihe na-ekpochapụ oghere